成果题名:Epitaxial monocrystalline SiC films grown on Si by HFCVD at 780
作者: Zhang Zhiyong1, Zhao Wu2, Wang Xuewen2, Lei Tianming1, Chen Zhiming1, Zhou Shuixian2
成果题名:Epitaxial monocrystalline SiC films grown on Si by HFCVD at 780
作者: Zhang Zhiyong1, Zhao Wu2, Wang Xuewen2, Lei Tianming1, Chen Zhiming1, Zhou Shuixian2
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