MOCVD反应器中瞬态热流场的数值研究
首发时间:2009-04-02
摘要:利用二维动力学模型,通过优化计算MOCVD (Metal Organic Chemical Vapor Deposition) 反应器的进气流量、操作压力、衬底温度、基座旋转等几个重要工艺控制参数,得到了反应器内部均匀的流场和热场分布的形态变化。在此基础上,通过微扰反应器的进气量,计算并图形化了质量输运过程的瞬态行为,分析了延迟时间、驰豫振荡、自脉动振荡等瞬态现象产生的原因,为高品质外延生长工艺的设计与实施,提供了有益的解决途径。
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Numerical Studies on flow and thermal fields in transient state in MOCVD reactor
Abstract:A systematic study has been performed to investigate mass transport process in 2-D dynamic modeling for the flow and thermal patterns of vertical rotating Thomas Swan MOCVD reactor at low pressure. By varying and optimal calculating the several important process parameters of the reactor, it has been finally acquired the favorable conditions of the uniform distributions of velocity and temperature profiles in steady state. Then, time-dependent models of the MOCVD reactor can help identify the visual transient behavior inside the reactor and analyze the phenomena of delay time, relaxation oscillation and pulsative oscillation. The results are advantageous to deciding for the process conditions and the parameter optimization of the MOCVD reactor.
Keywords: heteroepitaxy MOCVD reactor transport process thermal and flow field
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