55LP Mask Reduction for Well Loop

• 1、 Huali Microelectronics Co., Ltd.

Abstract：This paper proposes a feasible way to decrease the cost of 55 nanometer low-power platform. On the basis of the existing technological process, the logic of the threshold of a 10-degree patch area and storage transistor well into the mask to merge, so as to realize the optimization of quantity of product process and streamlined. Through a lot of data collection and calculation, this paper gives a kind of both neither affect work, high threshold logic transistor can guarantee the normal work of the storage devices, and through the flow verification, proved the reliability and feasibility of the model. The scheme can be parallel to 55 nanometer low-power platform has high threshold open device and static storage device of all the products.

Keywords： well IMP mask reduction WAT matching