热处理对于CIS器件中白色像素点的影响
首发时间:2018-06-08
摘要:对于互补金属氧化物半导体图像传感器CIS(CMOS Image Senor)器件来说,白色像素点(White Pixel,WP)的数目严重影响其成像质量,如何降低白色像素点已经成为改善CIS器件性能的重要方向。在整个制程的不同位置加入热处理过程,会改善界面处的晶格缺陷,降低界面态,从而降低漏电流,其对WP性能起到重要的改善作用,本文采用在制程的不同位置加入不同温度和时间长度的热处理过程,并得到结论:热处理过程越靠后,温度越高,时间越长,对WP的改善效果越好,并且存在叠加性和饱和性。
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The effects of heat treatment on white pixels for COMS Image Sensor
Abstract:For CIS (CMOS Image Senor) device, the White pixels (WP) seriously affect the quality ofimaging. How to reduce the WP has become an important direction for CIS performance improvement.Adding anneal process in different positions of the whole process, will reduce lattice defects and the interface state, so as to reduce the leakage, which plays a important role in improving the WPperformance, this paper adopted in the process of different positions in different temperature and time, the length of the heat treatment process and get the conclusion:add anneal at the back end of all process, higher anneal temperature and the longer anneal time willachieve better the effect on WP improvement, and the improve result has additive and saturated effect.
Keywords: COMS White Pixel dark current themral treatment
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