某国产DRIE干刻反应腔外聚焦环表面粗糙度对颗粒数目影响的机理研究
首发时间:2018-08-29
摘要:本文阐述某国产设备厂商某型号深反应离子刻蚀(deep reactive ion etching, DRIE)设备干刻反应腔副产物沉积在外聚焦环(cover ring)表面,由于副产物剥落,容易导致颗粒增多的问题。通过对cover ring材质粗糙度分析,发现增加cover ring表面粗糙度能够加强副产物的稳定性,从而减少因副产物不稳定而产生的颗粒,避免了对产品的影响。随着刻蚀产品数量的增加,工艺过程中会产生较多副产物沉积于cover ring。通过采取增加cover ring表面粗糙度,来控制并改善副产物剥落现象,大幅降低了副产物沉积在cover ring表面导致颗粒增多的问题发生,有效地提高了机台的有效运行率。
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Study on the impact of surface roughness of the cover ring on the number of particles for a domestic DRIE
Abstract:This paper describes that dry etching reaction chamber easily suffers particle high issue because of polymer spalling from cover ring of certain type of deep reaction ion etching equipment in some domestic equipment manufacturer. Through surface roughness analysis of cover ring, It is found that increasing the surface roughness of cover ring could enhance the stability of polymer. This reduces the number of particles produced by polymer instability in order to avoid the impact on the product. As the number of etched products increases, more polymer deposites on cover ring surface in process. Through increasing the surface roughness of the cover ring, we can control and improve the spalling of polymer. The problem of increased particles caused by polymer deposition on the surface of cover ring was significantly reduced. The effective operation rate of the machine is improved effectively.
Keywords: Cover ring Surface roughness Particle
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某国产DRIE干刻反应腔外聚焦环表面粗糙度对颗粒数目影响的机理研究
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