硼热扩散掺杂的6H-SiC单晶光学和电学特性研究
首发时间:2022-05-17
摘要:本文在1250℃~1450℃温度范围,采用热扩散方法对高阻6H-SiC单晶进行硼掺杂,研究了不同温度对硼掺杂高阻6H-SiC单晶的光学和电学特性影响。相较于未掺杂的6H-SiC单晶,透射谱测试结果表明,硼扩散后6H-SiC单晶对400~800nm波段的光吸收增大,且吸收边向长波长方向偏移。采用范德堡法对硼扩散后6H-SiC单晶的电阻率进行了测试,计算结果表明,在1250℃氧气气氛下平躺有间距扩散、并在1450℃氧气气氛下激活的6H-SiC表面电阻率约为1 kΩcm,相较于未掺杂的单晶样品降低了4个数量级。
关键词: 微电子学与固体电子学 6H-SiC 热扩散 硼掺杂 电学特性 光学特性
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Study on optical and electrical properties of boron thermal diffusion doped 6H-SiC single crystal
Abstract:In this paper, high resistance 6H-SiC single crystal was doped with boron by thermal diffusion method in the temperature range of 1250 ℃ ~ 1450 ℃. The effects of different temperatures on the optical and electrical properties of borondoped high resistance 6H-SiC single crystal were studied. Compared with the undoped 6H-SiC single crystal, the transmission spectrum test results show that the light absorption of the 6H-SiC single crystal in the 400~800 nm band increases after boron diffusion, and the absorption edge shifts to the long wavelength direction. The resistivity of 6H-SiC single crystal after boron diffusion was measured by the van der Pauw method. The calculation results show that the surface resistivity of 6H-SiC lying flat with spacing diffusion in an oxygen atmosphere of 1250℃ and activated in an oxygen atmosphere of 1450℃ is about 1 kΩcm, which is 4 orders of magnitude lower than that of the undoped single crystal sample.
Keywords: Microelectronics and Solid State Electronics 6H-SiC Thermal Diffusion Boron Doping Electrical Properties Optical Properties
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