Single and double layers of tungsten oxide and vanadium oxide thin films have been deposited on In2O3:SnO2 (ITO) glass using the pulsed laser deposition (PLD) technique at a substrate heating temperature of structural properties and chemical composition of as-deposited WO3 (V) and V2O5 (Ti) thin films were analyzed using X-ray diffraction (XRD), Raman spectrum (RS), and X-ray photo-electron spectroscopy (XPS). The as-deposited V2O5 doped WO3thin film on ITO glass showed an amorphous structure. Highly oriented growth nano-crystalline TiO2doped V2O5 thin films with polycrystalline orthorhombic structure were successfully synthesized on ITO glass using the scanning laser ablation technique at a deposition temperature as low as 200C. Cyclic voltammograms, at a sweep rate of 50 mV s1, show that long-term degradation was noticed for the as-deposited WO3 (V) thin film, and no long-term degradation was noticed for the as-deposited double layer WO3 (V) V2O5 (Ti) thin film. Durability was verified to 8000 cycles in the voltage range between 1.0 and 1.0V. It is demonstrated that these double layer WO3 (V) V2O5 (Ti) thin films on ITO are good candidates for cathode thin films for rechargeable batteries and electrochromic devices. As the additional top layer of V2O5 (Ti) possesses nano-crystalline and c-axis oriented structure, which is suitable for Li-ions transport, the cycle stability and reversibility of WO3 (V) films have been improved. Double layer WO3 (V) V2O5 (Ti) thin films provide a neutral brownish blue electrochromic color. Therefore, this double layer film maybe suitable for most building applications.