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姜恩永

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期刊论文

Facing targets sputtered Fe-N gradient films

姜恩永E. Y. Jiang D. C. Suna) C. Lin M. B. Tiana) H. L. Bai and S. Liu Ming

J. Appl. Phys. 78 (4), 15 August 1995,-0001,():

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摘要/描述

Fe-N gradient films were prepared with a facing targets sputtering system. During deposition, the nitrogen pressure increased linearly up to a value, which is called the "ultimate pressure." Composition profiles, microstructure, magnetic properties, and corrosion resistance of the films were investigated by various methods. The experimental results indicate that the Fe-N films possess some composition and structural gradients. The Fe concentration decreases from the substrate to the film surface from 100 to 66 at. %. The phases α"-Fe16N2, γ'-Fe4N, ε-FexN(2<x≤3) and ζ-FeN are present in the gradient films at different depths. Ms under the ultimate nitrogen pressure of 0.05 Pa has a value of 1803 emu/cc which is higher than that of bulk iron, this is attributed to the presence of Fe16N2. Increasing further the ultimate nitrogen pressure, Me decreases monotonically. The corrosion resistance of the gradient film with higher nitrogen concentration near the surface is good enough t'or magnetic recording heads. ~ 1995 American Institute of Physics.

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