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刘兴钊

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The crystal perfection improvement of Y1 Ba2 Cu3 O7-x thin films by afterglow plasma process

刘兴钊X.Z. Liu a* Y.R. Li a B.W. Tao a A. Luo a J. Geerk b

Thin Solid Films 371 2000. 231-234,-0001,():

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摘要/描述

In this article, we report the growth of purely (001). oriented single crystal Y1Ba2Cu3O7yx thin films with excellent crystal perfection by afterglow plasma sputtering. Because of little energetic ion and electron bombardment, the crystal perfection of Y1Ba2Cu3O7yx thin films was significantly improved. The full width at half-maximum value of the rocking curve around the (005). diffraction peak of the films is 0.12

版权说明:以下全部内容由刘兴钊上传于   2009年05月18日 15时44分06秒,版权归本人所有。

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