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刘兴钊

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The preparation of double-sided YBCO thin films by simultaneous sputtering from single target

刘兴钊X.Z. Liu* B.W. Tao A. Luo S.M. He Y.R. Li

Thin Solid Films 396(2001)225-228,-0001,():

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摘要/描述

The preparation of 1-inch double-sided YBCO thin films by simultaneous sputtering from a single target is reported. By rotating the substrate around the rod of the substrate holder and the normal of the substrate, YBCO thin films were simultaneously deposited on both sides of 1-inch (100)LaAlO3 substrate from a single inverted cylindrical sputter gun. The TC0 values of the YBCO thin films on both sides of the wafer were 90.3 and 90.4K, respectively. The transition width was 0.8K. The microwave surface resistance, Rs (77K, 10GHz), of the YBCO thin films on both sides of the wafer were 330 and 400mV, respectively. The uniformity of Rs values over the whole 1-inch wafer is good and the properties of YBCO thin films were found to be very similar on both sides of the wafer.

版权说明:以下全部内容由刘兴钊上传于   2009年05月18日 15时44分26秒,版权归本人所有。

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