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刘兴钊

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期刊论文

The effect of deposition rate on the microstructure of YBCO thin films prepared by inverted cylindrical magnetron sputtering

刘兴钊X.Z. Liu* Y.R. Li B.W. Tao A. Luo S.M. He

Physica C 371(2002)133-138,-0001,():

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摘要/描述

The dependence of YBCO thin film properties on the deposition rate was studied in this report. The thermodynamic growth parameters (substrate temperature, total pressure and oxygen partial pressure) were optimized at a fixed deposition rate first. Then keeping the thermodynamic growth parameters optimized values, YBCO thin films were deposited at different deposition rates. The effect of the deposition rate on the superconducting transition properties, caxis lattice constant, concentration of lattice disorder and surface smoothness of YBCO thin films was studied. The measurements show that the optimized thermodynamic growth parameters are closely correlated to the deposition rate. At a fixed deposition rate of 0.5AA/s and its optimal thermodynamic growth parameters, YBCO thin films with superior superconducting transition temperature, the lowest concentration of lattice disorder, and the lowest surface roughness were prepared. By using the same thermodynamic growth parameters, changes in deposition rate were shown to degrade the superconducting transition temperature, increase the lattice disorder, and increase the roughness of the YBCO thin films.

版权说明:以下全部内容由刘兴钊上传于   2009年05月18日 15时44分46秒,版权归本人所有。

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