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期刊论文

碳纳米管/硅纳米线阵列异质结构的制备及其光电响应与硅纳米线长度的依赖关系

孙家林曹阳贺军辉朱嘉麟

Chemical Physics Letters 501 (2011) 461–465,-0001,():

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摘要/描述

Heterojunction structures were fabricated, which consisted of a double-walled carbon nanotube (DWCNT) thin film coated either on an n-type silicon wafer or an n-type silicon nanowires (SiNW) array with varied lengths. Current–voltage characteristics measured under laser (532 nm) irradiation showed that the photoresponse [(light current  dark current)/dark current] of the heterojunctions dramatically depends on the length of SiNWs. Increase in the length of SiNWs led first to increase and then to decrease in the photoresponse of DWCNT/SiNW heterojunction. The heterojunction with a SiNW length of ca. 600 nm has the highest the photoresponse value of 10.72.

【免责声明】以下全部内容由[孙家林]上传于[2011年02月12日 19时30分47秒],版权归原创者所有。本文仅代表作者本人观点,与本网站无关。本网站对文中陈述、观点判断保持中立,不对所包含内容的准确性、可靠性或完整性提供任何明示或暗示的保证。请读者仅作参考,并请自行承担全部责任。

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