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期刊论文

Controllable nanogap fabrication on microchip by chronopotentiometry

向娟Bo Liu a Juan Xiang a Jing-Hua Tian Can Zhong b Bing-Wei Mao a Fang-Zu Yang a Zhao-Bin Chen a Sun-Tao Wu b Zhong-Qun Tian a

Electrochimica Acta 50(2005)3041-3047,-0001,():

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摘要/描述

This work aims to solve one of the key issues for developing molecular and nanoscale devices, i.e., how to controllably fabricatenano/angstrom-size gaps on microchips. It has been shown that with a galvanostat and use of the electrode potential as the feedback,we can be used to electrochemically fabricate metallic electrode pair with controlled gap widths ranging from about ten nanometers downto few angstroms. It is based on probing the potential drop in the electrical double layer across the two electrodes during the narrowing ofthe gap. The process is simple and controllable, allowing rapid fabrication of nanogaps and adaptation of a commonly used electrochemicalinstrument.

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