Pulsed laser deposition is a very promising experimental technique for growing layers of nanoscale thickness. In this paper, the growth of a perovskite structured film grown on a perovskite substrate is simulated using the Monte Carlo procedure and LaMnO3 is taken as an example. In the model, we consider the motion of the La and Mn atoms, and assume the oxygen atoms follow the metal atoms. The quality of the film is controlled by three parameters: namely, the temperature of the substrate, the kinetic energy of the atoms, and the average coverage of each pulse. The simulated results show that the quality of the films is strongly dependent on the three parameters. We analyzed the composition of the films layer by layer and find an interesting phenomenon: if the deposition conditions are not optimal, the fraction of wrong atoms fractional mismatch presents odd-even staggering as the number of deposited atom layers increases.