-
120浏览
-
0点赞
-
0收藏
-
0分享
-
308下载
-
0评论
-
引用
期刊论文
Study on the preparation and properties of copper nitride thin films
Journal of Crystal Growth 274(2005)464-468,-0001,():
Copper nitride (Cu3N) thin films were prepared on glass substrates by reactive radio-frequency (RF) magnetron sputtering under different nitrogen flow rate. The thermal stability of the Cu3N films was investigated through vacuum annealing treatment at different temperature. X-ray diffraction, scanning electron microscopy and near-normal reflectance spectra were employed to characterize the films. The deposited Cu3N films take on a different preferred orientation, which changed from (111) to (100) with increase of N2 ratio. The grains size of thin films can become small when the N2 ratio increases. The Cu3N phase can completely decompose into Cu and N2 through vacuum annealing treatment at a temperature of 200 1C. The reflectance of as-deposited Cu3N films is quite different from decomposed films.
【免责声明】以下全部内容由[闫鹏勋]上传于[2005年07月19日 00时02分57秒],版权归原创者所有。本文仅代表作者本人观点,与本网站无关。本网站对文中陈述、观点判断保持中立,不对所包含内容的准确性、可靠性或完整性提供任何明示或暗示的保证。请读者仅作参考,并请自行承担全部责任。
本学者其他成果
同领域成果