马胜利
个性化签名
- 姓名:马胜利
- 目前身份:
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- 学位:
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学术头衔:
博士生导师, 教育部“新世纪优秀人才支持计划”入选者
- 职称:-
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学科领域:
材料科学基础学科
- 研究兴趣:
学习与工作简历 2001年10月西安交通大学博士毕业,2003年11月西北工业大学博士后出站,2002年11月-2003年4月德国慕尼黑工业大学访问进修,2004年7月德国慕尼黑工业大学和法国巴黎高等工业技术学院短期交流,2004年教育部新世纪优秀人才支持计划入选者。现为西安交通大学材料科学与工程学院副教授,兼任中国真空学会高级会员、陕西省机械工程学会表面工程分会理事,金属材料强度国家重点实验室学术秘书。
学术及科研成果作为负责人主持国家和地方科技项目10余项,包括国家科技攻关计划项目1项、教育部新世纪优秀人才支持计划项目1项、国家自然科学基金面上项目2项等;作为研究骨干参与国家863计划项目3项、国家自然科学基金重点项目1项、国家自然科学基金委国际合作重大项目1项、欧盟第五框架计划项目1项等。以主要完成人身份获陕西省科技进步一等奖1项、教育部提名国家技术发明二等奖1项,获授权发明专利3项,完成的博士论文先后被评为2001年西安交通大学优秀博士论文和2004年陕西省优秀博士论文,在国内外重要学术期刊发表论文80余篇,SCI、EI收录30篇,引用20篇次。
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345
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成果数
10
马胜利, Dayan Ma*, Shengli Ma, Kewei Xu
,-0001,():
-1年11月30日
Multiphase nanocomposite thin films composed of nanocrystalline TiN, nanosized amorphous Si3N4, and occasionally amorphous or nanocrysralline TiSi2, were deposited on high-speed steel substrate at 550 1C, using an industrial setup of pulsed-d.c. plasma-enhanced chemical vapor deposition technique. Feed gases used were TiCl4, SiCl4, N2, and H2. The composition of the films could be controlled well, through adjustment of mixing ratio of chlorides. The Si contents in films varied in the range 0-35 at%. It was found that Si contents in coatings play a great role on the quality of Ti-Si-N coatings. Ti-Si-N coatings of high Si contents were less dense than that of low Si contents. Ti-Si-N coatings with coarse grains show poor adhesion to substrates and high electrical resistance. The results indicated clearly that wear-resistant properties of TiN coating remarkably increase with addition of silicon, while friction coefficient remains high (about 0.8) at room temperature and reduces only slightly at elevated temperature (about 0.7 at 400℃). There was a much lower wear resistance in higher-Si-content films due to coarse mirostructure during formation of coating.
Plasma enhanced CVD, Nano-structured, Ti-Si-N, Wear
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引用
马胜利, S. Ma a, b, J. Procházka b, P. Karvánková b, Q. Ma a, X. Niu a, X. Wang a, D. Ma a, K. Xu a, S. Vepǐek b, *
Surface & Coatings Technology 194(2005)143-148,-0001,():
-1年11月30日
Superhard nanocomposite nc-TiN/a-Si3N4 coatings were prepared by reactive magnetron sputtering (RMS) and pulsed dc plasma-induced chemical vapour deposition (PCVD) on stainless steel substrates. The tribological behaviour of these coatings at room and elevated temperature was compared with that of TiN coatings deposited by RMS and PCVD. The results show that the superhard nanocomposite nc-TiN/a-Si3N4 coatings have a somewhat higher friction coefficient of 0.55-0.7 at room temperature that decreases to about 0.4-0.5 at 550 ℃. However, the friction coefficient of pure TiN coatings is 0.6 at room temperature and increases to 0.7 after a sliding distance of 0.1 km at 550℃.
Superhard nanocomposite coatings, Friction coefficient, Hardness
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马胜利, Shengli MaU, Yanhuai Li, Kewei Xu
Surface and Coatings Technology 131(2000)131-135,-0001,():
-1年11月30日
The possibility of surface modification on dyes and tools is investigated with pulsed d.c. plasma enhanced chemical vapor deposition PECVD.on an industrial scale. The effects of pulsed parameters such as pulsed voltage and pulsed frequency on the performance of the coated samples are analyzed based on mechanical testing and microstructural examinations. The tested samples are titanium nitride film coated on steels and cemented carbides. Experiments indicate that the inner-wall of the holes can be coated with the aid of pulsed d.c. plasma, and the quality of coatings depends to a great extent on the pulsed parameters. The adhesion strength characterized by the critical force in indentation test can be increased over 1000N on the high-speed steel substrate when the processing condition is optimized, and the processing procedure plays an important role in the pulsing deposition.
Plasma enhanced chemical vapor deposition, Hard coating, Mechanical property, Pulsed d., c., power
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马胜利, Shengli Ma a, b, *, Kewei Xu a, Wanqi Jie b
Surface & Coatings Technology 185(2004)205-209,-0001,():
-1年11月30日
Ti-6Al-4V alloy has been used with some success in orthopedic devices and other engineering components due to several beneficial properties. However, inadequate wear behavior of Ti-6Al-4Valloy has largely restricted fields of application for this material. In this paper, a new method of plasma nitriding and plasma-enhanced chemical vapor deposition (plasma-duplex process) was conducted on Ti-6Al-4V alloy in order to modify its wear performance. The results indicate that the plasma nitriding processing temperature plays a dominant role in nitrided layer formation when compared to other nitriding parameters (e.g. treatment time, gas flow ratio of H2/N2 etc.). It is also shown that plasma nitriding and TiN coatings produced by plasma-duplex processing provide a marked improvement in the wear performance of the modified Ti-6Al-4V alloy surface. However, the friction coefficients of plasma-duplex treated samples increased significantly compared to the substrate. There is also a negative effect on the wear behavior if the TiN coating adhesion is poor.
Plasma-duplex process, Ti-6Al-4V alloy, Wear behavior, Titanium nitride (, TiN), coatings
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【期刊论文】Parametric effects of residual stress in pulsed d.c. plasmaenhanced CVD TiN coatings
马胜利, S. Ma*, K. Xu, J. He
Surface and Coatings Technology 142-144(2001)1023-1027,-0001,():
-1年11月30日
In order to design coatings with optimized wear and corrosion performance, knowledge of residual stress in hard coatings and its dependence on the processing parameters is required. In the present paper, TiN coatings deposited onto tool steels using pulsed d.c. plasma enhanced chemical vapor deposition were investigated. The processing parameters, including pulse voltage, pulse frequency and pre-nitriding time were varied. The residual stress was measured with X-ray diffraction and the interfacial adhesion between the coating and the substrate was evaluated using both indentation test(Pc)and scratch test(Lc). It was found that the residual stress and the adhesion could be adjusted by the processing parameters, and a correlation between these two properties was established. It was also evident that the residual stresses in coating deposited in the industrial-scale pulsed d.c. plasma CVD facility were much smaller than in those deposited in a conventional laboratory-scale chamber with d.c. power.
Plasma enhanced chemical vapor deposition, TiN, Residual stress, Adhesion
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49浏览
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马胜利, Shengli Ma a, b, *, Kewei Xu a, Wanqi Jie b
Surface & Coatings Technology 191(2005)201-205,-0001,():
-1年11月30日
Pulsed direct current (dc) plasma-enhanced chemical-vapor deposition (PECVD) holds great advantages such as plasma permeation and deposition in the inner wall of holes and narrow cracks usually encountered in complex components. In this work, plasma nitriding and TiCN coatings on H13 steel have been developed using pulsed dc PECVD. The composite layer has been characterized with respect to its microhardness, adhesion, and microstructure. The results indicate that with the assistance of plasma nitriding, the composite layer improves the surface microhardness and interfacial adhesion between the coating and substrate. The application of this duplex-plasma processing on a hot-working die made of AISI H13 steel provides a significant increase in lifetime for the steel. This is a more-successful processing technique than conventional techniques, which usually do not improve the surface properties of dies, with complex shapes and demanding performance requirement conditions. However, extra hardening of this composite layer is not always advantageous. Microhardness (related to layer's strength) and adhesion, as well as the toughness of the coating system, should all be considered together.
Composite layer, Plasma nitriding, Pulsed dc PECVD, Hot-working die, TiCN
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【期刊论文】Effecting of oxygen and chlorine on nano-structured TiN/Si3N4 films hardness
马胜利, Ma Dayan a, Ma Shengli a, Xu Kewei a, *, S. Veprek b
Materials Letters xx(2004)xxx-xxx,-0001,():
-1年11月30日
Using direct current plasma-enhanced chemical vapor deposition (PECVD) techniques, the nanocomposite coatings of nc-TiN/a-Si3N4 11 were deposited on stainless steel substrates. The coatings were characterized by nano-indentation, elastic recoil detection spectroscopy 12 (ERD), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM). The effects of 13 oxygen and chlorine were investigated in this paper. A certain content of oxygen and chlorine can strongly decrease the hardness of superhard 14 of nc-TiN/a-Si3N4. It is shown that 1-1.5 at.% of oxygen causes a decrease in hardness decrease to a value of about 30 GPa as compared to 15 45-55 GPa for a the that of below 0.2 at.% oxygen.
nc-TiN/, a-Si3N4, Superhard, Oxygen, Chlorine
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马胜利, Dayan Ma, Shengli Ma, Kewei Xu*
Surface and Coatings Technology 184(2004)182-187,-0001,():
-1年11月30日
Multiphase nanocomposite thin films composed of nanocrystalline TiN, nano-sized amorphous Si3N4, free silicon, and occasionally amorphous or nanocrystalline TiSi2, were deposited on HSS substrate at 550 ℃ using an industrial set-up of pulsedd. c. plasma enhanced chemical vapor deposition technique. The composition of the films could be controlled well through adjustment of N2 flow rate and the mixing ratio of the chlorides. The Si contents in the films varied in a range of 0-40 at.%. The microhardness of the coatings increased firstly with increasing Si content, reached a maximum value of about Hv 5700 at the content of 13 at.% Si in the coatings, and then decreased at high Si contents.
Nanocomposite Ti-Si-N coatings, PECVD, Micro-hardness, Amorphous phases
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马胜利, Shengli Ma, a) Dayan Ma, and Kewei Xu, Wanqi Jie
J.Vac. Sci. Technol. B 22 (4), Jul Aug 2004,-0001,():
-1年11月30日
Ti-Si-N coatings have been investigated widely in recent years due to their unique nanocomposite microstructure and attractive properties of superhardness, fairly good oxidation-resistance nearly to 1000℃, etc. In this study, Ti-Si-N coatings have been prepared by pulsed dc plasma-enhanced chemical vapor deposition in an industrial-scale chamber. Structural characterization of Ti-Si-N coatings was examined by x-ray diffraction, x-ray photoelectron spectroscopy, scanning electron micrograph, and transmission electron microscopy. The results show that: (1) The microstructure of Ti-Si-N coatings varies significantly with the processing parameters, (2) the microstructure can be confirmed as nanocomposite Ti-Si-N where nanocrystalline TiN and/or TiSi2 particles are embedded into an amorphous matrix of Si3N4, and (3) the nanocrystals have a multioriented microstructure. However, the silicon content in Ti-Si-N coatings and coating thickness as well as crystalline size all increase when the inlet gas ratio of X=[SiCl4/(TiCl4+SiCl4)]% increases. Whereas the microhardness of the coatings first increases with increased Si content, microhardness reaches a maximum value of about Hv5800 at 13 at.% Si and then decreases slightly.
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马胜利, Shengli Ma, Yanhuai Li, Kewei Xu*
Surface and Coatings Technology 137(2001)116-121,-0001,():
-1年11月30日
In order to improve the adhesion behavior of TiN coatings deposited on H13 steel, a layered composite structure has been developed by plasma nitriding and plasma-enhanced CVD in the present studies. Effects of the nitriding process on the microstructure, adhesion and microhardness, as well as the residual stress of composite nitrided H13 TiN coatings were investigated. Experimental results showed that the adhesion of TiN coatings to substrate could be remarkably enhanced by an optimized plasma nitriding process conducted at a 25% flow ratio of N2 (H2 N2) for 1h. The formation of a new compound layer during a nitriding process at a 50% flow ratio of N2 (H2 N2) deteriorates the adhesion of TiN coatings due to premature brittle fracture between the coating and the substrate. The surface hardness of nitrided H13 TiN coatings and compressive residual stress in the diffusion interlayer increase with increasing pre-nitriding time, but the adhesion of the coatings decreases to some extent.
Plasma duplex treatment, Plasma-enhanced chemical vapor deposition (, PECVD), TiN, Nitriding process, H13 steel
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