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朱爱民, Qi Sun, Aimin Zhu, , Xuefeng Yang, Jinhai Niu and Yong Xua
CHEM. COMMUN., 2003, 1418-1419,-0001,():
-1年11月30日
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朱爱民, By Ai-Min Zhu, Long-Hui Nie, Qing-Hao Wu, Xiu-Ling Zhang, Xue-Feng Yang, Yong Xu, and Chuan Shi
Chem. Vap. Deposition 2007, 13, 141-144,-0001,():
-1年11月30日
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朱爱民, Xiu-Ling Zhang, , Long-Hui Nie, Yong Xu, Chuan Shi, Xue-Feng Yang, and Ai-Min Zhu
J. Phys. D: Appl. Phys. 40 (2007) 1763-1768,-0001,():
-1年11月30日
At atmospheric pressure and room temperature, dielectric barrier discharge induced plasma oxidation for achieving supported TiO2 photocatalysts derived from TiCl4 adsorbed onto γ-Al2O3 pellets was studied. The supported TiO2/γ-Al2O3 photocatalysts prepared by a cyclic ‘adsorption–discharge’ approach, without requirement of heat treatment, exhibit high activity in the photocatalytic degradation reaction of formaldehyde. The mass spectra and optical emission spectra during O2/Ar discharge for oxidizing the adsorbed-state TiCl4 were measured. The mechanism for the TiO2 formation from adsorbed-state TiCl4 by plasma oxidation was discussed.
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朱爱民, Zhu Aimin, , Nie Longhui, Zhang Xiuling, Shi Chuan, Song Zhimin, Xu Yong
Plasma Science & Technology, Vol. 6, No. 6, Dec., 2004,-0001,():
-1年11月30日
A supported TiO2/γ-A12O3 photocatalyst has been prepared by γ-Al2O3 pellet-filled dielectric barrier discharges induced plasma CVD at atmospheric pressure and room temperature. The TiO2/γ-A12O3 photocatalyst exhibits higher photocatalytic activity than Degussa P25, and much higher photocatalytic activity than that prepared by thermal CVD.
plasma CVD, dielectric barrier discharges, photocatalyst
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朱爱民, Xiao-Song Li, Chuan Shi, Yong Xu, , Xiu-Ling Zhang, Kang-Jun Wang, Ai-Min Zhu
Plasma Process. Polym. 2007, 4, 15-18,-0001,():
-1年11月30日
A novel process consisting of a pulsed streamer discharge over Ni/HZSM-5 catalysts for an oxygen-free conversion of methane to aromatics is reported here. This plasma-over-catalyst process shows a significant synergetic effect on promoting methane conversion to aromatic products and high stability. Using this process at atmospheric pressure and a temperature of 573 K, significant amounts of aromatics have been obtained.
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