Ion-beam assisted deposition (IBAD) was carried out to deposit hydroxyapatite (HAp) on alumina substrate. The amorphous coating layer on alumina substrate is crystallized to the dense HAp after a post. treatment process of annealing at 500℃ for 2 h and immersion in deionized water for 72 h at room temperature. The homogeneous and dense HAp coating is observed by scanning electron microscopy and the thickness of the coating is measured to be about 638 um. The hardness of the coating 1ayer in the as-deposited and post-treated samples is 475 and 508, respectively. The adhesive strength between HAp and α-alumina substrate was measured by a scratch test. The ion-beam sputtered coatings were used as control samples, the adhesion was found to be worse for ion-beam sputtering deposition (IBSD) than for IBAD.