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期刊论文
Pulsed excimer (KrF) laser induced crystallization of PbZr0.44Ti0.56O3 amorphous films
Appl. Phys. Lett. 66 (19), 8 May 1995，-0001，（）：
Amorphous PZT thin films 600nm thick were rf sputtered from a PbZr0.44Ti0.56O3 ceramic target with excess PbO onto glass substrates maintained at room temperature. After irradiation with a 248 nm KrF pulsed excimer laser with a power density of 2.33107W/m2 at a frequency of 50Hz and a pulsed width of 30ns for 2min, the films crystallized into the PZT perovskite structure to a depth of about 120 nm. Comparisons of this work with PZT crystallization obtained from a traditional oven and 488 nm Ar1 laser postdeposition treatments are also given.
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