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Density functional theory study of adsorption and dissociation of HfCl4 and H2O on Ge/Si (100)-(2

张卫Wei Chen Hong-Liang Lu David Wei Zhanga) Min Xu Jie Ren Jian-Yun Zhang Ji-Tao Wang and Li-Kang Wang

APPLIED PHYSICS LETTERS 86, 142901(2005),-0001,():

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摘要/描述

We have investigated adsorption and dissociation of water and HfCl4 on Ge/Si(100)-(231) surface with density functional theory. The Si-Ge heterodimer and Ge-Ge homodimer are employed to represent the Si1−xGex surface. The activation energy for adsorption of water on Ge-Ge homodimer is much higher than that on Si-Ge heterodimer. No net activation barrier exists during the adsorption of HfCl4 on both SiGe surface dimers. The differences in the potential energy surface between reactions on Si-Ge and Ge-Ge dimers are due to different bond strengths. It should also be noticed that the activation energy for HfCl4 is quite flat, thus HfCl4 adsorbs and dissociates on Ge/Si (100)-(231) easily.

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【免责声明】以下全部内容由[张卫]上传于[2005年10月31日 18时33分29秒],版权归原创者所有。本文仅代表作者本人观点,与本网站无关。本网站对文中陈述、观点判断保持中立,不对所包含内容的准确性、可靠性或完整性提供任何明示或暗示的保证。请读者仅作参考,并请自行承担全部责任。

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