Binding energies of elements at the interface of oxygen-ion-irradiated ZrO2-Y2O3 films on an iron substrate were investigated by using X-ray photoelectron spectroscopyXPS. combined with ion etching. In addition to Zr or Fe simple binary suboxides, it is found that some Zr-O-Fe-like bonding configuration is formed due to ion irradiation, which has a favorable effect on the adhesion of the film to the substrate.

Carbon films were deposited by r.f. magnetron sputtering on tungsten substrates followed by irradiating processes with nitrogen and argonions. Microanalyses were used to obtain information on the phase, composition and chemical states of elements in the samples. It is found that Ar+ ion irradiation did not lead to the formation of tungsten-carbide, while nitrogen ions bombardment can induce formation of WCx, and at the same time, can react with tungsten to form the WN phase. With alternating Ar+ and nitrogen ions, the carbon films on tungsten substrate were transformed into tungsten-carbide.