Via a specially widened anodic aluminum oxide (AAO) pore arrays, carbon nanodot arrays with uniform size and high density were obtained through filtered cathodic arc plasma (FCAP) technique. The AAO template was prepared in oxalic acid by multi-steps to get a specially enlarged opening which plays an important role in the deposition of nanodots. The morphology of the nanodots was studied by a field emission scanning electron microscopy (FESEM). The diameter of the as-prepared nanodot demonstrated here is about 100 nm at the bottom and less than 40 nm at the top, and the density was estimated to 1010 cm2. Field emission properties of the nanodot arrays were investigated and a low threshold field of 5.1 V/mm at 10 mA/cm2 was obtained. In this paper, the carbon nanodot arrays grown as replicas of the specially widened AAO template may support a strategy to realize the fabrication of nanodot arrays with various materials.

通过对阳极氧化铝(AAO) 模板进行特殊扩孔处理,消除了AAO 模板中带电阴离子对沉积碳离子的不良影响, 利用磁过滤阴极弧等离子沉积技术成功制备了非晶碳纳米尖点阵列膜. 场发射扫描电镜(FESEM) 分析表明,经过氧化和扩孔多步处理制备的AAO 模板具有特殊的开口结构,制备的非晶碳纳米尖点阵列完整地复制了AAO 模 板的孔道阵列结构,纳米点排列整齐有序,直径约100 nm ,密度达1010 cm- 2 ,样品的场发射测试显示,非晶碳纳米点阵列具有良好的电子发射性能,发射电流为10 mA/cm- 2时的阈值电场为317 V/μm.