成果题名:Copper metallization of low-dielectric-constant a-SiCOF films for ULSI interconnects
作者: Shi-Jin Ding 1, Qing-Quan Zhang 1, David Wei Zhang 1, Ji-Tao Wang 1 and Wei William Lee 2
成果题名:Copper metallization of low-dielectric-constant a-SiCOF films for ULSI interconnects
作者: Shi-Jin Ding 1, Qing-Quan Zhang 1, David Wei Zhang 1, Ji-Tao Wang 1 and Wei William Lee 2
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