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期刊论文

Diffusion annealing of the copper-silver bimetallic strips at different temperature

孟亮L. Meng S.P. Zhou F.T. Yang Q.J. Shen M.S. Liu

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摘要/描述

Copper-silver bimetallic strips prepared by cold roll cladding have been treated by diffusion annealing in the temperature range 250-800℃. The interface bonding level and the hardness in the matrix copper and silver have been determined and the microstructure in the interface region has been observed. The interface bonding level is essentially improved under the conditions of annealing at both temperatures 400℃ and 800℃. A high diffusion temperature can make the hardness reduce in the strips. Recrystallization just starts in the strips annealed at 250℃ and mainly emerges at 400℃. Annealing above 600℃ can produce the fine grain areas between the interface and the silver matrix. If diffusion treatment induces the recovery, recrystallization or the partial fusion at the bonding interface, the interface bonding level can be enhanced.

【免责声明】以下全部内容由[孟亮]上传于[2004年12月31日 20时39分15秒],版权归原创者所有。本文仅代表作者本人观点,与本网站无关。本网站对文中陈述、观点判断保持中立,不对所包含内容的准确性、可靠性或完整性提供任何明示或暗示的保证。请读者仅作参考,并请自行承担全部责任。

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