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【期刊论文】The effect of Co addition on the saturation magnetization of Fe16N2
姜恩永, E. Y. Jiang, H. Y. Wang a), Z. W. Ma b)
JOURNAL OF APPLIED PHYSICS VOLUME 85, NUMBER 8 15 APRIL 1999,-0001,():
-1年11月30日
The effects of Co addition on the structure and the saturation magnetization of Fe16N2 were investigated. Enhancement of the formation of Fe16N2 phase by Co addition was observed. Films with 5-25 at% Co contents deposited at proper conditions exhibit a high saturation magnetization up to the range of 2.5-2.7 T. The saturation magnetization of (Fe, Co) 16N2 alloys phase is expected to be 2.8-2.9 T, which is as large as that of Fe16N2. This demonstrates that proper Co addition does not induce notable changes in the high saturation magnetization of the Fe16N2.
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姜恩永, Hui Liu, E. Y. Jiang, and H. L. Bai a), R. K. Zheng, H. L. Wei, and X. X. Zhang
APPLIED PHYSICS LETTERS VOLUME 83, NUMBER 17 27 OCTOBER 2003,-0001,():
-1年11月30日
Polycrystalline Fe3O4 films have been prepared by reactive sputtering at room temperature. Transmission electron microscopy images show that the films consist of quite uniform Fe3O4 grains well separated by grain boundaries. It was found that the tunneling of spin-polarized electrons across the antiferromagnetic coupled grain boundaries dominates the transport properties of the films. Magnetoresistance (MR) {=[ρ(H)-ρ(0)]/ρ(0)} shows linear and quadratic magnetic-field dependence in the low-field range when the field is applied parallel and perpendicular to film plane, which is similar to the behaviors observed in the epitaxial Fe3O4 films consisting of a large raction of antiferromagnetic antiphase domain boundaries. At 300K, the size of the MR reaches 27.4% under a 50-kOe magnetic field, which is a very large MR for polycrystalline Fe3O4 films.
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【期刊论文】Facing targets sputtered Fe-N gradient films
姜恩永, E. Y. Jiang, D. C. Sun, a) C. Lin, M. B. Tian, a) H. L. Bai, and S. Liu Ming
J. Appl. Phys. 78 (4), 15 August 1995,-0001,():
-1年11月30日
Fe-N gradient films were prepared with a facing targets sputtering system. During deposition, the nitrogen pressure increased linearly up to a value, which is called the "ultimate pressure." Composition profiles, microstructure, magnetic properties, and corrosion resistance of the films were investigated by various methods. The experimental results indicate that the Fe-N films possess some composition and structural gradients. The Fe concentration decreases from the substrate to the film surface from 100 to 66 at. %. The phases α"-Fe16N2, γ'-Fe4N, ε-FexN(2<x≤3) and ζ-FeN are present in the gradient films at different depths. Ms under the ultimate nitrogen pressure of 0.05 Pa has a value of 1803 emu/cc which is higher than that of bulk iron, this is attributed to the presence of Fe16N2. Increasing further the ultimate nitrogen pressure, Me decreases monotonically. The corrosion resistance of the gradient film with higher nitrogen concentration near the surface is good enough t'or magnetic recording heads. ~ 1995 American Institute of Physics.
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【期刊论文】Perpendicular magnetic anisotropy of NdFe films
姜恩永, Jiang En-yongt†‡, Wang Zhong-jie‡, and Li Jin-e‡
J. Phys.: Condens. Matter 2(1990)6089-6092. Printed in the UK,-0001,():
-1年11月30日
The perpendicular magnetic properties of NdFe alloy thin films have been studied on samples prepared by the facing targets sputtering method at a substrate temperature of 240-270 C. All the films with Nd content over 35 at.% exhibit perpendicular magnetic anisotropy. The Curie and crystalline temperatures were about 400 K and 630 K, respectively. The x-ray diffraction patterns show that the uniaxial anisotropy of a NdFe film has a certain relation to the partial oxidation of Nd in the film. The direction of the magnetic easy axis is determined by the orientation of C-Nd203; (440)-oriented C-Nd203 contributes to the formation of a perpendicular magnetic film. It is proposed that the partial oxidation of Nd may induce some short range atomic order in NdFe films.
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姜恩永, H.L. Bai, E.Y. Jiang, P. Wu, Z.D. Lou, Y.Wang, C.D. Wang
Appl. Phys. A 69, 641-647 (1999),-0001,():
-1年11月30日
The structural characterization of heat-treated CN films fabricated by dual-facing-target sputtering for soft X-ray multilayer mirrors was performed by means of X-ray diffraction (XRD), Raman spectroscopy (RS) and X-ray photoelectron spectroscopy (XPS). The XRD analyses indicate a graphization process in the CN films during thermal annealing. The Raman analyses imply that the primary bonding in the CN films is sp2. In other words, the formation of the sp3 bonding in the CN films can be suppressed effectively by doping with N atoms, and thus the thickness expansion resulting from the changes in the density of CN films during annealing can be decreased considerably. This result is also clarified by the increased conductivity measured. The XPS results give the information of the existence of the strong covalent bonding between N and C atoms, which can slow down the tendency of the structural relaxation during annealing. These results suggest that CN films suitable for soft X-ray multilayers used at high-temperature environments can be obtained by reactive dual-facing-target sputtering. With the low-angle X-ray diffraction measurements, we do observe the enhanced thermal stability of CoN=CN multilayers.
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