Near-stoichiometric LiNbO3 single crystals codoped with Zn and Fe (Zn:Fe:NSLN) were grown by Czochralski (CZ) method using Li-rich melts. Structure analysis was performed by the X-ray powder diffraction and ultraviolet–visible (UV) absorption spectra in these samples. Experimental results showed that the lattice constant values increased with the increasing ZnO content in melt and ultraviolet absorption edge shifts to the shorter wavelength when compared with pure near-stoichiometric sample in Zn:Fe:NSLN. In addition, the optical damage resistance was also measured, which was several order of magnitude increased when compared with near-stoichiometric LiNbO3:Fe (Fe:NSLN) crystal. Holographic experiments were performed to analyze quantitatively the enhancement of the optical damage resistance.

SMC模压成型过程固化度与温度是强耦合关系。为了对SMC模压成型过程非稳态温度场与固化度进行数值模拟，依据固化动力学和非稳态导热理论，建立了温度场和固化度动力学模型。通过DSC试验分析确定模型中固化度动力学参数。利用有限单元与有限差分相结合的方法，建立了温度场和固化度数值模型。应用Euler逐步迭代法实现了计算机解耦，数值模拟与试验比较，结果吻合，为优化模压成型工艺提供了理论依据。

聚合物基复合材料模压成型过程固化度与温度的动态变化为强耦合关系。本文作者根据固化动力学和传热学理论，建立了非稳态温度场与固化动力学数学模型。通过DSC实验分析确定模型中固化动力学参数。利用有限单元与有限差分相结合的方法，建立了温度场和固化度数值模型。应用Euler逐步迭代法实现解耦。对聚合物基复合材料模压成型过程固化度与非稳态温度场动态变化进行计算机数值模拟，与试验测定结果吻合。为优化模压成型工艺提供理论依据。

Three kinds of different Zn: Fe: LiNbO3 wafers are pre- pared by proper reduction or oxidation post-treatment processes. The optical-damage-resistance abilities and photorefractive properties are studied using the optical compensator technique and two-wave coupling measurement, respectively. The holographic storage properties, that is, diffraction efficiency, writing time, erasure time, photorefractive sensitivity, and dynamic range, are also measured or calculated. The analyses indicate that the sample disposed by reduction is the most proper media for holographic storage application.

Mg, Fe double-doped LiTaO3 and LiNbO3 crystals have been grown by Czochralski method. The optical properties were measured by two-beam coupling experiments and transmitted facula distortion method. The results showed that the photorefractive response speed of Mg: Fe: LiTaO3 was about three times faster than that of Fe: LiTaO3, whereas the photo-damage resistance was two orders of magnitude higher than that of Fe: LiTaO3. in this paper, site occupation mechanism of impurities was also discussed to explain the high photo-damage resistance and fast response speed in Mg: Fe: LiTaO3 crystal.