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2009年04月12日

【期刊论文】Size dependent charge storage effect of the InAs nanodots in Al0.5Ga0.5As

李树玮, Kazuto Koike, Hisayoshi Komai and Shuwei Li, Mitsuaki Yano a)

VOLUME 91, NUMBER 2 JOURNAL OF APPLIED PHYSICS 15 JANUARY 2002,-0001,():

-1年11月30日

摘要

This article describes size dependent charge storage effect of the InAs nanodots in the barrier layers of Al0.5Ga0.5As/GaAs field-effect diodes. This charging effect is analyzed by a capacitance-voltage (C-V) measurement at 77 K, and results in a clockwise hysteresis loop due to the electron storage at nanodot potentials. It is revealed that the number of stored electrons is nearly independent of dot size, and the amount of stored charge increases proportionally with dot density. The retention time of the stored charge, however, is deteriorated dramatically by the inclusion of coalesced dots in the storage nodes. These C-V characteristics are in good agreement with their photoluminescence properties.

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2009年04月12日

【期刊论文】Optical property of self-assembled InAs quantum dots in Al0.5Ga0.5As barriers grown by molecular beam epitaxy

李树玮, Shuwei Li a, *, Kazuto Koike b

Journal of Crystal Growth 263(2004)53-57,-0001,():

-1年11月30日

摘要

Photoluminescence (PL) of quantum dots embedded in high potential barriers is studied as functions of barrier thickness and temperature. With the increase of barrier thickness, both the strengthened two-dimensional electron gas (2DEG) structure and strongly localized electron wave functions can increase the carrier recombination. The optical properties of two different-barrier-thickness samples exhibit different characteristics with the decreased measurement temperatures. The PL recombination characteristic of the samples with the barriers adjacent to a Si-doping GaAs layer is different fromthat of samples with the barrier adjacent to an i-GaAs layer.

A1., Carrier recombination, A1., Optical property, A1., Photoluminescence, A3., Molecular beam epitaxy, A3., Self-assembled quantumdots

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2011年09月05日

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2009年04月12日

【期刊论文】Threshold voltage shift characterization of vertically stacked InAs nanodots in field-effect transistor

李树玮, Shuwei Li*, Kazuto Koike, Hisayoshi Komai, Mitsuaki Yano

Journal of Crystal Growth 227-228(2001)1166-1170,-0001,():

-1年11月30日

摘要

An Al0.5Ga0.5As/GaAs heterojunction field-effect transistor which consists of InAs nanodots in the barrier layer and a GaAs quantum well channel is grown by molecular beam epitaxy, and the device performance and the electron transport from the quantum well to the nanodots are studied. These InAs nanodots are grown by self-assembling in a vertically stacked form, and their optical and electrical properties are characterized by photoluminescence and capacitance-voltage measurements. The electrical injection of electrons confined at the nanodots produces a persistent electron trapping which yields a memory function in the device performance, showing a potential application for roomtemperature operation.

ctures, A3., Molecular beam epitaxy, B1., Nanomaterials, B2., Semiconducting Ⅲ-Ⅴ materials, B3., Field effect transistors

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2011年09月05日

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  • 李树玮 邀请

    中山大学,广东

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