Compositionally graded (Pb, Ca) TiO3 thin films were prepared on platinum-coated silicon substrates by a monoethanolamine-modified sol-gel technique. The crystalline orientation and surface morphology of the graded films were related to the deposition sequence of the film layer. The dielectric constants, for up-graded and down-graded films annealed at 600

Compositionally graded (Pb,La) TiO3 thin films were prepared on platinum-coated silicon substrates by a sol-gel technique. The crystalline orientation and surface morphology of the graded films were closely related to the deposition sequence of the film layer. The dielectric constants, for up-graded and down-graded films annealed at 600

Compositionally step-varied (Pb, Ca) TiO3 thin films were prepared on platinum-coated silicon substrates by a monoethanolamine-modified sol-gel technique. The dielectric constant and dissipation factor were found to be 342 and 0.019, respectively, for thin films of 0.6mm in thickness annealed at 550

Compositionally graded (Pb, Ca) TiO3 thin films were prepared by a monoethanolamine-modified sol-gel technique on platinum-coated silicon substrates at the annealing temperature of 600

Band-gap energies of sol-gel-derived SrTiO3 thin films were studied in terms of annealing temperature and film thickness. The band-gap energies of highly crystallized films were comparable to those of single crystals reported, whereas for poor-crystallized films, their band-gap energy values were much larger than those of single crystals. The larger band-gap energy shift was believed to be mainly due to both quantum size effect and existence of amorphous phase in thin films. The band-gap energies also showed a strong dependence on film thickness. There was a critical film thickness (～200 nm), above which the films had band-gap energies close to those of crystals or bulks, but below that, the values shifted largely, which can be attributed to the influence of crystallinity of thin films. Such a thickness effect of band-gap energy should be of high interest in optical device applications.