成果题名:The influence of Ar addition on the structure of an a-SiOCF film prepared by plasma-enhanced chemical vapour deposition
作者: Shi-Jin Ding 1, Peng-Fei Wang 1, David Wei Zhang 1, Ji-TaoWang 1 and Wei William Lee 2
成果题名:The influence of Ar addition on the structure of an a-SiOCF film prepared by plasma-enhanced chemical vapour deposition
作者: Shi-Jin Ding 1, Peng-Fei Wang 1, David Wei Zhang 1, Ji-TaoWang 1 and Wei William Lee 2
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