利用磁过滤阴极弧等离子体沉积装置在单晶硅基底上制备了类金刚石涂层，采用原子力显微镜和纳米压痕仪测定了其表面形貌及硬度，在DF2PM型动2静摩擦系数精密测定仪上考察了涂层在不同载荷及湿度下同GCr15钢对摩时的摩擦性能。结果表明，在不同环境湿度条件下DLC涂层的摩擦性能明显不同，这主要归因于转移膜形成机理的不同；在3N载荷下，DLC涂层同GCr15钢对摩时的摩擦系数相对较小，且较为稳定；当环境湿度增大至100%时，摩擦系数显著增大，并发生类似于含氢类金刚石涂层的灾难性磨损。

Lanthanum-modified lead zirconate titanate (PLZT) thin films, with the La/Zr/Ti ratio being 9/63/37, were deposited on indium tin oxide (ITO)-coated glass substrate by R.F. magnetron sputtering method. Effects of heat-treatment conditions on the structure and chemical homogeneity of the PLZT thin films were investigated by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The PLZT thin films with desired perovskite structure were obtained after covered with lead oxide and then annealed at 625℃ for 150 min. The binding energy of Pb4f7/2, Ti2p3/2, Zr3d5/2, La3d5/2, and O1s in PLZT thin films were: 138.3, 455.7, 181.2, 835.9, and 529.4 eV, respectively. The excess lead oxide in the PLZT thin films promoted the perovskite structure formation, and baffled the movement of TiO2 and ZrO2 as well. A small quatity of TiO2 and ZrO2 coexisted with PLZT in the surface of samples. And the lack of oxygen inside the films resulted in the valence decrease of a little part of Ti's from +4 to +2.

采用自行研制的实验装置，用阳极弧放电等离子体方法制备了高纯镍纳米粉末。利用X射线衍射（XRD）、透射电子显微镜（TEM）和相应选区电子衍射（ED）、BET吸附等对样品的成分、形貌、晶体结构、晶格常数、粒度及其分布、比表面积进行了分析。建立了关于金属超微粒产生过程的近似模型，分析了纳米粉的形成和生长机制，并对整个工艺过程影响纳米粉性能的各种工艺参数进行了理论探讨。结果表明：所制得的镍纳米粉纯度高，晶格结构与相应的致密体相同，为fcc相结构，平均粒径为47nm，粒径范围在20～70nm，比表面积为14.23m2/g，呈规则的球形链状分布，并发现纳米晶体的晶格常数发生膨胀。

在室温条件下，利用自行设计的平面“S”形磁过滤等离子体设备，在（111）面单晶硅上制备TiN薄膜，通过改变基底偏压和反应气体成分，即通过改变氮气和氩气的气体流量来改变沉积离子的能量和密度，从离子轰击的角度研究了沉积条件对TiN薄膜织构的影响。对薄膜的表面形貌进行观察，（θ～2θ）和1.5°掠入射2种X射线衍射方法对薄膜晶体结构和晶面取向进行了分析，对薄膜进行了电子衍射研究。结果显示磁过滤等离子制备的TiN薄膜表面平整光滑，颗粒尺寸为20～70nm，且基底偏压和氩气流量的增大促使薄膜发生（111）面的择优取向，且（111）晶面与膜表面平行，而在高氩气流量的情况下，（200）和（220）面在薄膜平面也发生了定向排列。

The effect of annealing on the electrochromic (EC) properties of nickel oxide (NiOx, x>1) films prepared by reactiverf sputtering is studied with electrochemical measurements, optical transmittance analysis, scanning tunneling microscope (STM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). Research results show that EC properties of NiOx films can be changed greatly by annealing. The mechanism for the change of electrochromic properties was discussed in details.